Seungwoo Lee, Jonghwa Shin, Hong Suk Kang, Yong-Hee Lee, Jung-Ki Park*
Highlighted as a “Frontispiece” of Advanced Materials, 23(29), 3244-3250 (2011)
Article first published online: 3 JUN 2011
Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.