Department of Chemical and Biomolecular Engineering
Korea Advanced Institute of Science and Technology

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[Frontispiece] Deterministic Nanotexturing by Directional Photofluidization Lithography

Seungwoo Lee, Jonghwa Shin, Hong Suk Kang, Yong-Hee Lee, Jung-Ki Park*

Highlighted as a “Frontispiece” of Advanced Materials, 23(29), 3244-3250 (2011)


Article first published online: 3 JUN 2011

DOI: 10.1002/adma.201100662 

http://onlinelibrary.wiley.com/doi/10.1002/adma.201100662/abstract



Abstract

Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.


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등록일2011-08-25

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